Hydrogen-free DLC coating device (high-density sputtering ADMS device)
Forming hydrogen-free DLC films (hydrogen content below 1%) with unique technology, exhibiting excellent tribological properties in oil, and compatible with conductive carbon thin films.
Achieving a hydrogen-free DLC film (hydrogen content in the film below 1%) that is unprecedented in conventional production equipment. Utilizing a high-density plasma sputtering technology that does not use hydrogen in the film formation process, with a new type of PVD equipment (ADMS = Arc Discharge Magnetron Sputtering Device). The hydrogen-free dense DLC film reduces the sliding characteristics in Mo-added lubricants to less than 1/15 compared to conventional hydrogen-containing DLC films (from 1 to 0.06). The latest film formation process also accommodates the formation of conductive carbon thin films, expanding applications across a wide range of fields from biotechnology to new energy. The low-voltage, low-pressure plasma generated by the newly developed arc discharge magnetron cathode is applied not only for film formation but also for ion nitriding and etching of substrate surfaces, providing high-quality integrated processing from pre-treatment and substrate hardening to coating. The hydrogen-free DLC film (ADMS-CN film) produced by this device (arc discharge magnetron sputtering device) represents a new dry process that goes beyond traditional DLC (hard film formation), significantly broadening the possibilities of plasma surface treatment technology.
- Company：神港精機 東京支店
- Price：Other
